Read text A carefully paying attention to the words in bold type

Translate the sentences. Pay attention to the words in italics.

Deposit neutral source vaporization

Credit with generation resemble tunnel

Configuration flux reenter trajectory

Closed-loop film realize technique

Closed-field emerge racetrack target surface

Arrangement dissociation rate sputter-gun (S-gun)

Advantage density particle scanning

Words to be remembered.

1. She realized her ambition of becoming a programmer.

2.He spoke English so well that I never realized he was German.

3.The density of gas was rather low.

4.Cover the food with a piece of plastic film.

5. Flux is a substance added to a solid to assist in its fusion.

6. Neutral is a term indicating that a solution or substance is neither acidic nor alkaline.

7. The most well-known example of a neutral substance is pure water.

8. Titanium is a malleable and ductile metal that resembles iron.

9. Nitrogen is a colorless, odorless gas, which exists as a molecule.

10. Argon is one of a group of gases called the inert gases.

11. Carbon is a non-metallic element, which occurs as diamond, graphite and carbon black.

12. Mercury is a silvery-white liquid metal. It is known to be the only liquid metal element at room temperature.

13. There are various techniques for producing special effects in films.

14. We drove at a steady rate.

15. When water boils the process of vaporization takes place.

16.There is a new generation of vacuum systems at the plant.

A. The “Closed loop”, the “S-gun”, the “Planar” Magnetrons

The effects of magnetic fields on the trajectories of electrons had been realized even before Penning work, and studies continued after Penning published his work. The early Penning discharges used magnetic fields that were parallel to the sputtering target surface. Magnetron sources which use magnetic fields that emerge and reenter a surface in a “closed loop” pattern can be used to confine electrons near the surface in a closed pattern “racetrack”. The confined electrons generated high- density plasma near the surface and were used in developing the “surface magnetron” sputtering configurations of the 1970s.

In 1968 Clarke developed a sputtering source using a magnetic tunnel on the inside of a cylindrical surface. This source became known as the “sputter gun” or “S-gun”. Various magnetron configurations were also patented. John Chapin developed a planar magnetron source in 1974 and is credited with being the inventor of the planar magnetron-sputtering source. Major advantages of these magnetron-sputtering sources were that they could provide a long-lived, high-rate, large area, low-temperature vaporization source that was capable of operating at lower gas pressure. Besides, they offered higher sputtering rates than non-magnetic sputtering sources. With these superior characteristics magnetron sputtering became the most widespread PVD coating technique.

Comprehension Check – 1

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